摘要
超纯水作为与电子元器件接触最多的介质之一,在半导体行业中占据着重要地位。本文从工艺路线、费用投资、运行成本及二次污染等方面,探讨针对小水量超纯水制备的最佳工艺路线。最终证明:在进水水质、产水水质以及产水量等条件相同的前提下,采用全膜法制备超纯水比2B3T工艺更具有优势,也将成为未来制备小水量的超纯水系统的主体工艺。
Ultrapure water,as one of the media most in contact with electronic components,plays an important role in the semiconductor industry.This paper discusses the best process route for the preparation of small amount of ultra pure water from the aspects of process route,cost investment and operation cost,secondary pollution and so on.It is finally proved that under the same conditions of inlet water quality,produced water quality and water yield,the preparation of ultra pure water by full membrane method has more advantages than 2B3T process,and will also become the main process of preparing ultra pure water system with small water volume in the future.
关键词
超纯水
全膜法
2B3T
小水量系统
ultrapure water
full membrane method
2B3T
small water system