载玻片为基底制备钛薄膜的研究

Study on the Titanium Thin Films Using Glass Slide as Substrate

采用磁控溅射法,以普通载玻片为基底,制备了不同厚度的金属钛薄膜,在添加光栅掩模版后,制备了钛薄膜光栅。采用控制变量法,重点研究了不同溅射时间(10 min、15 min、20 min、30 min、40 min、50 min)对金属钛薄膜厚度、透过率、电阻率的影响,并测量了所制备的钛薄膜光栅的光栅常数。结果表明,增加溅射时间,在载玻片表面制备的金属钛薄膜的厚度也呈现出增加的趋势。但金属钛薄膜的透过率和电阻率却呈现现相反的趋势,即随着溅射时间的增加而减小;采用分光光度计测量薄膜光栅的光栅常数为0.168 mm.

Titanium(Ti)thin films with different thickness were prepared by using glass slide as substrate via magnetron sputtering technology.Ti thin film grating were also fabricated with the assist of grating mask.The effects of sputtering time on the thickness,transmittance and resistivity as well as grating constants of Ti thin films were detailed investigated.The results revealed that the thickness of the Ti thin films increased with the increasing of the sputtering time while the transmittance and resistivity decreased with the increasing of the sputtering time,and the grating constants of Ti thin films were about 0.168 mm.