摘要
文章在理论方面利用亚波长孔阵结构透射峰位关系公式,针对光谱探测器件所需要的具备单峰窄带透射特性的介质-金属-介质的三层结构"双玻孔阵"结构模型的窄带单峰透射结果,基于现有的加工工艺对较常出现的上沿过刻、孔底残留和孔底过刻三种实验误差进行了潜在失效模式分析,与标准双玻孔阵模型对比结果,分析得到加工误差对窄带单峰透射的各种影响及产生的机理。对利用双玻孔阵结构的异常透射原理对入射光进行选择性透过制备出的新型像素级滤光膜系的制备工艺有一定的指导意义。
In theory,the formula of transmission peak position of subwavelength hole array structure is used,aiming at the narrow-band single peak transmission results of the dielectric metal dielectric three-layer structure"double glass hole array"structure model with single peak narrow-band transmission characteristics required by the spectral detector device,and based on the existing processing technology for the more common upper edge over etching,double glass hole array structure The potential failure modes of residual hole bottom and over etching hole bottom are analyzed.Compared with the standard double glass hole array model,the effects of processing errors on narrow-band single peak transmission and the mechanism are analyzed.It has a certain guiding significance for the preparation of a new type of pixel level filter film system by using the abnormal transmission principle of double glass hole array structure to selectively transmit the incident light.
作者
孙哲
任玉
石晶
宋晨智
周建伟
蔡红星
SUN Zhe;REN Yu;SHI Jing;SONG Chenzhi;ZHOU Jianwei;CAI Hongxing(College of Science,Changchun University of Science and Technology,Jilin Key Laboratory of Spectral Detection Science and Technology,Changchun 130022,China)
出处
《光学技术》
CAS
CSCD
北大核心
2022年第2期184-188,共5页
Optical Technique
基金
吉林省科技厅发展计划基金(20190303108SF)。
关键词
近红外
双玻孔阵
带通滤光膜
表面等离激元
near infrared
double glass hole array
band pass filter
surface plasmon
