钙钛矿太阳能电池中NiO_(x)空穴传输层的研究进展

Research progress of NiO_(x) hole transport layer in perovskite solar cells

半导体氧化镍(NiO_(x))价格便宜、空穴迁移率高、化学稳定性好且可低温制备,由其作为空穴传输层(HTL)制备的反式钙钛矿太阳能电池极具市场应用前景。NiO_(x) HTL的制备与优化对电池器件的性能至关重要。系统介绍了钙钛矿太阳能电池中NiO_(x)薄膜的制备工艺及其研究进展。阐述了O_(2)-plasma、紫外、表面钝化等后处理方式对NiO_(x)薄膜的缺陷态、表面化学状态以及材料功函数的调控影响。重点综述了掺杂(过渡金属、碱金属、稀土元素掺杂和元素共掺杂)对NiO_(x)薄膜光学和电学性能以及器件光电性能的影响。最后对NiO_(x)基钙钛矿太阳能电池的未来发展方向进行了展望。

Recently,nickel oxide(NiO_(x))has been using as a promissing hole transport layer(HTL)in perovskite solar cells(PSCs),due to its low cost,high hole mobility,good chemical stability and low-temperature processability.And the trans perovskite solar cells prepared by NiO_(x) HTL are showing great market application prospects.The preparation and optimization of NiO_(x) HTL are critical to the performance of the photovoltaic devices.Therefore,in this paper,the preparation process and research progress of NiO_(x) thin films in PSCs are systematically introduced.Then the effects of post-treatment methods such as O_(2)-plasma,ultraviolet,and surface passivation on the defect state,surface chemical state and material work function of NiO_(x) thin films are emphatically analyzed.The progress of doping(like transition metal,alkali metal,rare earth element doping and element co-doping)on the optical and electrical properties of NiO_(x) thin films and the optoelectronic properties of devices are summarized in detail.Furthermore,the future development directions of NiO_(x)-based PSCs are prospected.