摘要
本文利用脉冲激光沉积技术在LaAlO;(001)衬底上生长了单晶锐钛矿和双相TiO_(2)薄膜,并利用X射线衍射和透射电子显微术对薄膜的显微结构进行了系统表征。单晶锐钛矿薄膜在LaAlO;(001)衬底上实现了外延生长,双相TiO_(2)薄膜以单晶锐钛矿TiO_(2)为基体,在其中夹杂着金红石TiO_(2)颗粒。TiO_(2)薄膜的相结构可通过调整靶材与衬底的间距来调控,远靶基距(150 mm)利于单晶锐钛矿薄膜生长,近靶基距(50 mm)易获得双相TiO_(2)薄膜。锐钛矿TiO_(2)电镜样品在离子减薄过程中易发生表面还原,导致电镜观察中出现莫尔条纹。研究表明30%H_(2)O_(2)浸泡可有效去除离子减薄样品表面的损伤层,防止莫尔条纹的出现。
In this paper,single-crystal anatase and dual-phase TiO_(2)thin films were grown on LaAlO;(001) substrates by pulsed laser deposition.The microstructures of the as-prepared thin films were systematically characterized by X-ray diffraction and transmission electron microscopy.Single-crystal anatase thin films were epitaxially grown on LaAlO;(001) substrates,and dual-phase TiO_(2)thin films were composed of the single-crystal anatase TiO_(2)matrix and numerous embedded rutile particles.The phase structure of the TiO_(2)thin films can be adjusted by changing the target-substrate distance.The long target-substrate distance(150 mm) is conducive to the growth of single-crystal anatase films,while the short target-substrate distance(50 mm) promotes the formation of dual-phase TiO_(2)films.TEM samples of anatase TiO_(2)are prone to surface reduction during the ion thinning process,resulting in the appearance of moiré fringes in TEM observations.It is revealed that 30% H_(2)O_(2)immersion can effectively remove the damage layer on the surface of the ion-thinned sample and prevent the appearance of moiré fringes.
作者
李祥
姚婷婷
江亦潇
陈春林
马秀良
叶恒强
LI Xiang;YAO Ting-ting;JIANG Yi-xiao;CHEN Chun-lin;MA Xiu-liang;YE Heng-qiang(Shenyang National Laboratory for Materials Science,Institute of Metal Research,Chinese Academy of Sciences,Shenyang Liaoning 110016;School of Material Science and Engineering,University of Science and Technology of China,Shenyang Liaoning 110016;Ji Hua Laboratory,Foshan Guangdong 528200,China)
出处
《电子显微学报》
CAS
CSCD
北大核心
2022年第2期111-116,共6页
Journal of Chinese Electron Microscopy Society
基金
国家自然科学基金资助项目(Nos.52125101,51971224)
中国科学院前沿科学重点研究项目(No.QYZDY-SSW-JSC027)
广东省基础与应用基础研究重大项目基金(No.2021B0301030003)
季华实验室项目(No.X210141TL210)。