摘要
综述了热纳米压印、紫外纳米压印、微接触印刷三种具有代表性的纳米压印(NIL)技术的原理、工艺流程和优缺点,并介绍了近几年来纳米压印技术的研究进展及其在光学器件、存储器、柔性器件和生物传感器等领域中的应用现状。
The principle,process flow,advantages and disadvantages of three representative nanoimprint lithography(NIL)technologies including thermal nanoimprint,UV nanoimprint and micro contact print are reviewed.The research progress of nanoimprinting technology in recent years and its applications in optical device,memory,flexible device and biosensor are introduced.
作者
张笛
张琰
孔路瑶
程秀兰
ZHANG Di;ZHANG Yan;KONG Luyao;CHENG Xiulan(Center for Advanced Electronic Materials and Devices,School of Electronic Information and Electrical Engineering,Shanghai Jiao Tong University,Shanghai 200240,China)
出处
《传感器与微系统》
CSCD
北大核心
2022年第5期1-5,共5页
Transducer and Microsystem Technologies
基金
科技部重点专项项目(2016YFB0200205)。
关键词
热纳米压印
紫外纳米压印
微接触印刷
光学器件
存储器
柔性器件
生物传感器
thermal nanoimprint lithography(T-NIL)
ultraviolet nanoimprint lithography(UV-NIL)
micro contact printing(μCP)
optical device
memory
flexible device
biosensor
