最优研发结构与创新--基于中国省级面板数据的实证研究

Optimal R&D Structure and Innovation:Evidence from Chinese Provincial Panel Data

文章基于中国2000—2020年省级面板数据,定义并计算了研发结构,利用专利数据衡量区域创新水平,研究了研发结构对创新的影响效应。研究发现,研发结构与创新之间存在倒“U”型关系,即创新水平随着基础研究与应用研究比值提高呈现增长速度先变快后减慢的现象。中国创新存在最优研发结构,基础研究与应用研究比值区间约为0.106~0.130。在研发结构达到最优区间之前,基础研究比值每增加1个标准差,发明专利和实用新型专利数量分别增加68.41%、27.80%。目前,中国需进一步提高基础研究投入比重,以实现高水平科技自立自强。

Based on China's provincial panel data between 2000 and 2020,this paper defines and calculates R&D structure,and uses patent data to measure regional innovation,studying the impact of R&D structure on innovation.The research finds that there is an inverted-U relationship between R&D structure and innovation,that is,the growth rate of innovation becomes faster first and then slows down with the increase of the ratio of basic research to applied research.China's innovation has an optimal R&D structure interval,with the ratio of basic research to applied research ranging from 0.106 to 0.130.Before the R&D structure reaches the optimal range,the number of invention patents and utility model patents increases by 68.41%and 27.80%when the ratio of basic research increases by one standard deviation.At present,China should further increase the proportion of investment in basic research to achieve sci-tech self-reliance and self-strengthening at higher levels.