摘要
Flexible memory devices are promising for information storage and data processing applications in portable,wearable,and smart electronics operating under curved conditions.In this work,we realized high-performance flexible ferroelectric capacitors based on Hf_(0.5)Zr_(0.5)O_(2)(HZO)thin film by depositing a buffer layer of Al_(2)O_(3)on polyimide(PI)substrates using atomic layer deposition(ALD).The flexible ferroelectric HZO films exhibit high remnant polarization(Pr)of 21μC/cm^(2).Furthermore,deterioration of polarization,retention,and endurance performance was not observed even at a bending radius of 2 mm after 5,000 bending cycles.This work marks a critical step in the development of high-performance flexible HfO_(2)-based ferroelectric memories for next-generation wearable electronic devices.
基金
This work was supported in part by the National Natural Science Foundation of China(Nos.61922083,61804167,61834009,61904200,and 61821091)
in part by the Strategic Priority Research Program of the Chinese Academy of Sciences(No.XDB44000000).
