三级公自转行星系统中弯月透镜表面膜厚均匀性的研究

Uniformity of Surface Film Thickness of Meniscus Lens in Third-Order Common Rotation Planetary System

为提高弯月透镜表面的膜厚均匀性,对三级公自转行星系统中弯月透镜表面进行了膜厚均匀性的研究。构建了三级公自转行星盘的运动轨迹方程,并根据膜厚计算公式,建立了与三级盘倾角、公转半径有关的弯月透镜表面相对膜厚分布模型,采用电子束蒸发和离子束辅助沉积技术对分布模型进行了实验验证。此外,根据多次实验结果优化三级公自转行星系统结构参数,以提高弯月透镜表面的膜厚均匀性。实验结果表明,在未使用修正挡板技术的情况下,当公转半径为650 mm、倾角为60°时,可将弯月透镜凸面表面膜厚均匀性控制在±2.45%以内。

In order to improve the film thickness uniformity of the meniscus lens surface,the film thickness uniformity of the meniscus lens surface in the third-order common rotation planetary system is studied.The motion trajectory equation of the third-order common rotation planetary disk is constructed.According to the film thickness calculation formula,the relative film thickness distribution model of meniscus lens surface is established which is related to the dip and revolution radius of the third-order disk.The distribution model is verified experimentally by electron beam evaporation and ion beam assisted deposition.In addition,the structural parameters of the third-order common rotation planetary system are optimized according to the multi-experimental results to improve the film thickness uniformity of the meniscus lens surface.The experimental results show that when the rotation radius is 650 mm and dip is 60°,the film thickness uniformity of the convex surface of the meniscus lens can be controlled within±2.45%without using the correction bezel technology.