摘要
超精密位移测量系统是光刻机不可或缺的关键分系统之一,而基于激光外差干涉技术的超精密位移测量系统同时具备亚纳米级分辨率、纳米级精度、米级量程和数米每秒的测量速度等优点,是目前唯一能满足光刻机要求的位移测量系统。目前应用于光刻机的超精密位移测量系统主要有双频激光干涉仪和平面光栅测量系统两种,二者均以激光外差干涉技术为基础。本文将分别对这两种测量系统的原理、优缺点以及在光刻机中的典型应用进行阐述。
Ultra-precision displacement measurement system is one of the indispensable key subsystems of the lithography machine.The ultra-precision displacement measurement system based on laser heterodyne interference technology has the advantages of sub nano resolution,nano precision,meter range and measurement speed of several meters per second.It is so far the only displacement measurement system that can meet the requirements of the lithography machine.At present,there are two kinds of ultra-precision displacement measurement systems used in lithography:dual frequency laser interferometer and plane grating measurement system,both of which are based on laser heterodyne interference technology.In this paper,the principles,advantages and disadvantages of the two measurement systems and their typical applications in lithography are described.
作者
张志平
杨晓峰
Zhang Zhiping;Yang Xiaofeng(Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement,Academy for Engineering and Technology,Fudan University,Shanghai,201203,China)
出处
《激光与光电子学进展》
CSCD
北大核心
2022年第9期287-294,共8页
Laser & Optoelectronics Progress
关键词
光刻机
外差干涉
双频激光干涉仪
平面光栅
lithography machine
heterodyne interference
dual frequency laser interferometer
2D grating
