基于不同衬底的TCO薄膜的激光刻蚀工艺研究

Study on Laser Etching of TCO Thin-Films on Different Substrates

为了探索对基于不同衬底的透明导电薄膜的图形化制作,研究了采用激光刻蚀基于玻璃和柔性PET衬底的ITO和FTO等TCO薄膜材料的优化工艺,考察了激光设备在不同工作功率和扫描速率下工作对刻蚀效果的影响。结果表明,玻璃基薄膜可采用2.3 W的刻蚀功率和500 mm·s^(-1)的扫描速率进行刻蚀,柔性PET基薄膜可采用1.2 W的刻蚀功率和500 mm·s^(-1)的扫描速率进行刻蚀;扫描速率越慢、激光功率越高,对薄膜的刻蚀速率就会越快;激光功率过高会导致柔性PET衬底发生高温热熔化而凸起形变,因此刻蚀时应适当降低刻蚀功率。综合而言,采用激光刻蚀法可高效率、高品质地实现对不同衬底上薄膜的图形化制作。

To realize the patterned fabrication of transparent conductive thin films based on different substrates,the optimization process of laser etching TCO thin films such as ITO and FTO based on glass and flexible PET substrates was studied.The influence of different working power and scanning rates of the laser equipment on the etching effect was investigated.The results show that the films based on the glass substrate can be etched with an etching power of 2.3 W and a scanning rate of 500 mm·s^(-1),and the films based on the flexible PET substrate can be etched with an etching power of 1.2 W and a scanning rate of 500 mm·s^(-1).The slower the scanning rate and the higher the laser power,the faster the etching rate of the film is.Because high laser power will cause high temperature thermal melting and bulge deformation of the flexible pet substrate,the etching power should be properly reduced during etching.In all,thin films on different substrates can be patterned with high efficiency and high quality by laser etching.