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利用变温霍尔效应计算N型Ge的杂质电离能和禁带宽度 被引量:2

Calculation of the ionization energy and band gap of N-type Ge by temperature-dependent Hall effect
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摘要 通过变温霍尔效应实验,在77~420K温度范围内对N型Ge标准样品的电学特性进行测量.根据对高温本征导电区斜率的计算,得到样品禁带宽度E_(g);对低温杂质电离区斜率的计算,得到样品杂质电离能E_(i).对计算结果进行比较,■及■曲线更适合用于计算禁带宽度;降温的■曲线更适合用于计算杂质电离能. Through the experiments of temperature-dependent Hall effect,the electrical characteristic of a N-type Ge sample was measured within a temperature range of 77~420K.The sample band gap width E_(g) was obtained according to the calculation of the slope of data curves in high-temperature intrinsic conductive region,and the ionization energy impurity E_(i) according to that in low-temperature impurity ionization region.It could be concluded that■and■curves were suitable for calculating E_(g) and cooling■curve was suitable for calculating E_(i).
作者 郑梓涵 黄之豪 符斯列 ZHENG Zi-han;HUANG Zhi-hao;FU Si-lie(National Demonstration Center for Experimental Physics Education,School of Physics and Communication Engineering,South China Normal University,Guangzhou 510003,China)
出处 《物理实验》 2022年第5期10-15,共6页 Physics Experimentation
基金 国家自然科学基金资助(No.10575039) 广东省自然科学基金资助(No.S2013010012548) 广东省高校特色创新项目资助(No.2018KTSCX121)。
关键词 变温霍尔效应 禁带宽度 杂质电离能 N型Ge半导体 temperature-dependent Hall effect band gap ionization energy impurity N-type Ge semiconductor
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