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基于饱和D最优设计方法的印刷工艺参数优化

Optimization of Printing Process Parameters Based on Saturated D-Optimal Design Method
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摘要 印刷质量对LTCC基板的制作有重要影响。为了制定合理的印刷工艺参数,采用饱和D最优设计方法,研究了印刷线宽与主要印刷工艺参数(离网间距、刮刀压力、刮刀角度)之间的关系。对试验数据进行了多元非线性回归分析,建立了印刷线宽与各种印刷工艺参数之间的数学模型,求出了最优参数,并对印刷质量进行了预测。试验及预测结果表明:预测误差在合理范围之内,具有较高的预测精度。该预测结果为印刷工艺参数的选取提供了依据,对提高印刷质量有一定的意义。 Printing quality has an important impact on the fabrication of LTCC substrates. In order to formulate reasonable printing process parameters, the relationship between printing line width and main printing process parameters(including off-grid spacing, squeegee pressure, squeegee angle) is investigated by using the saturated D-optimal design. Through multiple nonlinear regression on the experiment data, the mathematical model between printing line width and various processing parameters is established, the optimal parameters are obtained, and the printing quality is predicted. The experimental and prediction results show that the predicted error is within a reasonable range, and a high predicting accuracy is attained. The prediction results provide a basis for the selection of printing process parameters, and have certain significance for improving the printing quality.
作者 常勇超 李娟 马启武 CHANG Yong-chao;LI Juan;MA Qi-wu(The 2nd Research Institute of CETC,Taiyuan 030024 China)
出处 《科技创新与生产力》 2022年第4期132-134,138,共4页 Sci-tech Innovation and Productivity
关键词 微电子 低温共烧陶瓷 饱和D最优设计 印刷质量 回归模型 最优参数 microelectronics low temperature co-fired ceramic saturated d-optimal design printing quality regression model optimal parameters
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