响应曲面法优化还原型特利加压素氧化工艺研究

Response Surface Optimization of Oxidation Process of Reduced Terlipressin

利用过氧化氢氧化还原型特利加压素,研究反应时间、样品浓度(以还原型特利加压素计算)、反应pH、氧化剂与样品摩尔比(以还原型特利加压素计算)、反应温度对还原型特利加压素氧化率的影响。通过五因子二水平三中心点(分辨度Ⅴ)的部分析因试验得到影响显著的因子,即反应时间、反应pH、反应温度;随后进行三因子三水平的响应曲面试验,经过优化得到最佳反应条件为:反应时间26.72min、反应pH7.29、反应温度25.25℃,在该条件下还原型特利加压素的氧化率为90.14%。

This study aimed to establish an optimized method using hydrogen peroxide to oxidize reduced terlipressin.On the basis of factional factorial experiment that were done for exploring the effects of reaction time,sample concentration(calculated by reduced terlipressin),reaction pH,molar ratio of oxidant to sample(calculated by reduced terlipressin),reaction temperature,the interactive effects of three crucial technological parameters,including reaction time,reaction pH,reaction temperature were assessed by response surface methodology(RSM)involving a three-level central composite design and multiple regression analysis.Results showed that the optimal oxidation process of reduced terlipressin was based on oxidation for 26.72 min at pH 7.29 and 25.25℃.Under such conditions,the oxidation rate of reduced terlipressin is 90.14%.