2021 IEEE EMC&SIPI and EMC Europe国际学术研讨会--提名文章(二)

2021 IEEE International Symposium on EMC&SIPI and EMC Europe-Nominated Paper Part 2

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摘要 Auto Focus for Far Field Source Localization Using Emission Source Microscopy摘要:辐射源显微技术(ESM)是一种定位远场辐射源的有效技术。聚焦距离会影响图像质量,混淆辐射源的定位。本文采用图像处理中的自动聚焦方法,计算出具有最佳图像质量的聚焦距离。同时,计算局部源区域的对比度可显示出更好的抗噪性。这种ESM中的自聚焦算法可以方便地获得辐射源与扫描平面之间的精确距离,并可用于三维空间中的源定位。

出处《安全与电磁兼容》 2022年第4期90-94,共5页 Safety & EMC

关键词自动聚焦扫描平面 EMC 远场辐射图像质量图像处理源定位显微技术

分类号 TN03 [电子电信—物理电子学] TP391.41 [自动化与计算机技术—计算机应用技术]

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2021 IEEE EMC&SIPI and EMC Europe国际学术研讨会--提名文章(二)

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