不同波长的光源对疵病散射率的影响研究

Influence of Light Sources of Different Wavelengths on Scattering Rate of Defects

基于积分散射检测的原理设计了一种多波长疵病检测系统,选用了635 nm、525 nm及405 nm三种光源,以光电倍增管作为光电探测器,待测样品是两个刻有标准尺寸疵病的高透石英玻璃片,其中一个的宽度和深度均为20μm,另一个均为25μm,光源的功率分别为50 mW、80 mW。实验结果表明,405 nm所对应的散射率数值明显最高,即405 nm的光源疵病检测能力更强。该研究对于小尺寸疵病的检测及获取疵病的深度信息,具有很好的借鉴意义。

Herein,a multiwavelength defect detection system based on the theory of integral scattering detection is proposed.This system uses three light sources with wavelengths of 635 nm,525 nm,and 405 nm and employs a photomultiplier tube as the photodetector.Two samples of hightransmittance quartz glass sheets with standard size defects,one with a width and a depth of 20μm and the other with a width and a depth of 25μm,are evaluated.The powers of the light source are 50 mW and 80 mW,respectively.Experimental results show that the highest scatter rate is achieved using the 405 nm light source.Therefore,the detection ability of the 405 nm light source is stronger than those of the 635 nm and 525 nm light sources.The findings of this study provide a reference for detecting small defects and achieving defect depth information.