聚氨酯/炭黑微孔膜的制备及其在化学机械抛光中的应用

Preparation of Polyurethane/Carbon Black Microporous Membrane and Its Application in Chemical Mechanical Polishing

采用PU/DMF/H2O湿法交换技术,制备聚氨酯/炭黑(PU/CB)复合微孔膜,探究浆料中的CB添加量对PU/CB微孔膜的形态结构与性能的影响。通过化学机械抛光测试(CMP),对比自制抛光垫(H-CP)与国产抛光垫(CH-1)的抛光性能。结果表明:当CB添加量为9%,PU/CB的耐磨性达到0.0058 g/3500r,其拉伸强度4.49 MPa,并具有一定的导热性。去除速率(RR)与粗糙度变化(ΔR_(a))结果表明,H-CP比CH-1具有更优异的稳定性和抛光性能。

Polyurethane/carbon black(PU/CB) composite microporous membrane was prepared by PU/DMF/HO wet exchange technology. The effects of the amount of CB in composite on the morphology, structure and properties of PU/CB microporous membrane were investigated. The chemical mechanical polishing(CMP) test was carried out to compare the polishing performance of the self-made polishing pad(H-CP) and the domestic polishing pad(CH-1). The results show that when the content of CB is 9%, the wear resistance of the microporous membrane reaches 0.005 8 g/3 500r, its tensile strength is 4.49 MPa, and certain thermal conductivity is observed for the membrane. The CMP results show that the H-CP pad is of better stability in polishing removal rate and pad surface roughness than domestic polishing pad(CH-1).