芯片制造中的光学微纳加工技术前沿与挑战

The Frontiers and Challenges of Optical Micro-nano Fabrication Technology for Chip Fabrication

基于第282期“双清论坛”,本文分析了我国未来芯片及其制造技术发展面临的国际形势、技术挑战和发展趋势,回顾了光学微纳加工技术近年来与光学工程、物理学、电子科学与技术、仪器科学与技术、集成电路科学与工程等多个学科领域交叉取得的主要进展和成就,凝练了未来芯片制造中光学微纳加工技术亟需解决的基础科学问题,展望了光学微纳加工技术科学前沿,探讨了未来5~10年我国在该领域亟待关注的研究方向。

Based on the 282 nd issue of “Shuangqing Forum”, this paper analyzes the international situation, technical challenges and development trends of the future chips and their fabrication technology in our country. The main progress and achievements in optical micro-nano fabrication technology in recent years are reviewed, with multidisciplinary research involving optical engineering, physics, electronic science and technology, instrument science and technology, integrated circuit science and engineering, etc. The basic scientific questions that need to be solved in optical micro-nano fabrication technology for future chip fabrication are summarized. Finally, this paper forecasts the scientific frontier of optical micro-nano processing technology and discusses the research direction in this field in our country in the next 5~10 years.