N—Cl型卤胺抗菌材料紫外稳定性研究进展

Research progress on UV stability of N—Cl haloamine antibacterial materials

N—Cl型卤胺抗菌剂具有高效、快速、稳定、安全、可再生的抗菌性能,由其开发的抗菌材料广泛应用于医疗卫生、纺织、水过滤等领域。然而,N—Cl型卤胺抗菌材料在应用过程中受紫外光作用会使材料上的N—Cl键或抗菌剂与材料基质的连接共价键断裂,导致活性氯的含量降低,进而引起其抗菌性能的下降。如何提高N—Cl型卤胺抗菌材料的紫外稳定性受到了国内外学者的重点关注。该文首先阐述了N—Cl型卤胺抗菌剂的种类和造成N—Cl型卤胺抗菌材料中活性氯含量降低的因素;然后,综述了通过改变卤胺前驱体结构,引入纳米TiO_(2)、ZnO、AgCl无机粒子和有机紫外吸收剂来提高N—Cl型卤胺抗菌材料紫外稳定性的研究进展;最后,讨论了该研究领域所面临的问题和挑战,并对未来发展进行了展望。

Antibacterial materials developed from N—Cl haloamines are widely used in the fields of medical health,textile,water filtration etc due to their efficient,rapid,stable,safe,and renewable antibacterial properties.However,the N—Cl or covalent bonds formed between antibacterial agent and material matrix could be damaged by UV light,which would result in active chlorine content decrease thus leading to antibacterial performance decline.Therefore,how to improve the UV stability of N—Cl halamine antibacterial materials has attracted the attention of scholars worldwide.Herein,types of N—Cl halamine antibacterial agents and factors influencing active chlorine content decrease were firstly discussed,followed by summarization of UV stability improvement of N—Cl halogen amines by structure change of halogen amine precursor and introduction of nano TiO_(2),ZnO,AgCl inorganic particles and organic UV absorbers.In the end,the existing problems and challenges and future development directions were discussed and prospected.