氮化铬反应磁控溅射的状态空间模型预测控制

State Space Model Predictive Control of Chromium Nitride Reactive Magnetron Sputtering

为了制备出具有优良摩擦性能的氮化铬薄膜,采用了状态空间模型预测控制对氮气流量进行连续稳定控制。本文运用了靶电压控制法对氮气流量进行快速反馈控制,通过反应磁控溅射实验收集氮气流量与靶电压的迟滞效应数据,使用系统辨识法得到被控对象的数学模型,利用状态空间模型预测算法进行控制,并与PID控制对比研究。仿真结果表明状态空间模型预测控制的调节时间比PID控制快16 s,阶跃扰动比PID控制小七倍,模型预测控制具有更好的控制效果。在实验中应用状态空间模型预测控制氮气流量,制备的氮化铬薄膜进行摩擦系数的测试为0.7,实验达到预期效果。

In order to prepare a chromium nitride film with excellent friction properties,the state-space model predictive control is used to continuously and stably control the nitrogen flow.In this paper,the target voltage control method is used for rapid feedback control of nitrogen flow.The hysteresis effect data of nitrogen flow and target voltage are collected through reactive magnetron sputtering experiments.The mathematical model of the controlled object is obtained by the system identification method,and the state-space model is used to predict the algorithm used for control and compared with PID control.The simulation results show that the adjustment time of the statespace model predictive control is 16 seconds faster than that of the PID control,and the step disturbance is seven times smaller than that of the PID control.The model predictive control has a better control effect.In the experiment,the state-space model was used to predict and control the nitrogen flow.The friction coefficient of the prepared chromium nitride film was tested to be 0.7,and the experiment achieved the expected effect.