高分散稳定性CeO_(2)抛光液的制备及其抛光性能研究

Research on Preparation of CeO_(2) Polishing Slurry with High Dispersion Stability and Its Polishing Performance

通过湿固相机械法制备CeO_(2)悬浮液。在不同温度下焙烧Ce_(2)(CO_(3))_(3)制备CeO_(2)粉末,以无机酸作为分散剂,采用湿式球磨的方法进行CeO_(2)的分散,分别研究了分散剂的种类、料球比以及球磨液的pH值等因素对悬浮液分散性能的影响。结果表明,随着焙烧温度的升高,制备的CeO_(2)粉末的团聚程度先降低后升高。采用硝酸为新型分散剂,当焙烧温度为900℃、球磨液pH为2、料球质量比为1∶4时,所得CeO_(2)的平均粒径(D50)为230 nm。以此CeO_(2)悬浮液作为磨料,在磨料质量分数为1%、pH为5条件下,SiO_(2)材料的抛光速率可达248.9 nm/min,抛光后表面均方根粗糙度(RMS)为0.588 nm。研究结果可以对碳酸铈直接制备氧化铈悬浮液短流程开发提供参考。

CeO_(2) suspension was prepared by wet-solid phase mechanical method.CeO_(2) powder was prepared by Ce_(2)(CO_(3))_(3) calcined at different temperatures and dispersed by wet ball milling with mineral acid used as a dispersant.The effects of dispersant,ratio of material to balls and pH value on dispersion performance of suspension were studied separately in this paper.The results show that as the calcination temperature increases,the degree of agglomeration of the prepared CeO_(2) powder first decreases and then increases.The average particle size(D50)of the prepared CeO_(2) is 230 nm when nitric acid is used as the new dispersant,the calcination temperature is 900℃,the pH of the ball milling solution is 2,and the ratio of material to balls is 1∶4.Correspondingly,the polishing rate of SiO_(2) material can reach 248.9 nm/min in the slurry containing 1% prepared CeO_(2) at pH=5,and the root mean square roughness(RMS)of the polished surface is 0.588 nm.The research results will provide a reference for the short process development of preparing CeO_(2) suspension directly from Ce_(2)(CO_(3))_(3).