氧化铝薄膜的制备与结构缺陷研究

Study on preparation and structural defects of alumina film

阐述了氧化铝(AlO)薄膜4层结构与台阶结构,同时提出了薄膜中含有的2种缺陷结构。通过Ar~+溅射和退火获得氧化铝薄膜,基于超高真空非接触式调频原子力显微镜(UHV-NC-FM-AFM)测试技术,对所制作的氧化铝薄膜进行表征研究。通过对氧化铝薄膜构造与缺陷建模,结合实验分析,验证了薄膜结构和缺陷理论。缺陷结构高度为(50±20)pm,氧化铝薄膜台阶的高度约200 pm,薄膜周期结构与DFT计算理论模型中单元的大小基本一致,实验结果与理论值基本吻合,为后期蒸镀钯(Pd)实验奠定了基础。

Four-layer structure and step structure of alumina(AlO)film are described, at the same time, two kinds of defect structures in film are proposed.AlOfilm is obtained by Arsputtering and annealing.Based on the ultra-high vacuum non-contact frequency modulation atomic force microscope(UHV-NC-FM-AFM)testing technology, the characterization of the prepared film is studied.Through the modeling of the structure and defects of AlOfilm, combined with experimental analysis.The film structure and defect theory are verified.The height of the defect structure is(50±20)pm, and the height of the AlOfilm step is about 200 pm.The periodic structure of the film is basically consistent with the size of the unit in the DFT calculation theoretical model.The experimental results are basically consistent with the theoretical values, which lays a foundation for the later palladium evaporation experiment.