摘要
为了提高靶面水平磁感应强度的均匀性,设计了一种内外永久磁铁以“内圆外方,外围圆”的方式排布的圆平面磁控溅射靶阴极结构,并利用COMSOL软件对其磁场进行仿真模拟,再通过实验测量进行验证。实验验证的结果和仿真模拟的结果基本一致。圆平面磁场分布均匀,并且满足溅射磁感应强度为20~50 mT的基本要求,靶材利用率可达40%~50%,而且散热能力得到一定程度的提高。
In order to improve the uniformity of the horizontal magnetic induction on the target surface, a cathode target configuration with a cylindrical permanent magnet inside and some cuboidal permanent magnets outside arranged roundly was designed for circular magnetron sputtering. The magnetic field was simulated by COMSOL software and verified by measurement. The experimental results were basically consistent with the simulation results. The magnetic field of the circular plane was distributed uniformly, and met the basic requirements of magnetic induction i.e. 20-50 mT for magnetron sputtering. The target utilization rate reached 40%-50%, and the heat dissipation capacity was improved to a certain extent.
作者
李梦飞
叶伟
杜鹏飞
LI Mengfei;YE Wei;DU Pengfei(School of Mechanical Engineering,Shaanxi University of Technology,Hanzhong 723001,China)
出处
《电镀与涂饰》
CAS
北大核心
2022年第16期1189-1196,共8页
Electroplating & Finishing
基金
陕西省教育厅重点实验室项目(16JS016)
陕西省教育厅专项科研计划(18JK0151)。
关键词
磁控溅射
圆柱靶
磁场分布
有限元分析
仿真
magnetron sputtering
cylindrical target
magnetic field distribution
finite element analysis
simulation
