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卷烟主流烟气主要挥发性羰基物的模拟口腔沉积 被引量:1

Simulation of oral deposition of main volatile carbonyls following inhalation of mainstream cigarette smoke
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摘要 采用卷烟烟气口腔沉积模拟装置,对25种卷烟样品主流烟气主要挥发性羰基物的模拟口腔沉积情况进行了分析。结果表明:①各挥发性羰基物分析结果的日内、日间相对标准偏差均小于15%,大部分小于10%,模拟装置对挥发性羰基物的口腔沉积分析的稳定性良好。②不同挥发性羰基物的口腔沉积量由大到小依次为乙醛、甲醛、丙酮、丙醛、丙烯醛、丁醛、巴豆醛和2-丁酮,其中,甲醛和乙醛的沉积量显著高于其他挥发性羰基物;沉积比例由高到低依次为甲醛、乙醛、丙醛、丁醛、巴豆醛、丙烯醛、丙酮和2-丁酮。③烟气口腔刺激与甲醛、乙醛口腔沉积量显著负相关,相关系数分别为-0.916、-0.934,P值均小于0.01。 The oral deposition of main volatile carbonyls in mainstream smoke of 25 cigarette samples was analyzed by using a smoke oral deposition simulator.The results showed that:1)All of the intra and inter-day relative standard deviations of the analytical results of volatile carbonyls were less than 15%,and most of them were less than 10%,which demonstrated that the simulator had a good stability in oral deposition analysis of volatile carbonyls.2)The oral deposition amounts of different volatile carbonyls from high to low were acetaldehyde,formaldehyde,acetone,propionaldehyde,acrolein,butyraldehyde,crotonaldehyde and 2-butanone,in which the deposition amounts of formaldehyde and acetaldehyde were significantly higher than those of the other volatile carbonyls.The deposition ratios from high to low were formaldehyde,acetaldehyde,propionaldehyde,butyraldehyde,crotonaldehyde,acrolein,acetone and 2-butanone.3)There were significant negative correlations between smoke oral irritation and the oral deposition amounts of formaldehyde and acetaldehyde with the correlation coefficients of-0.916 and-0.934 respectively,and P values were both less than 0.01.
作者 曾世通 王丁众 刘珊 李鹏 席辉 付英杰 卢斌斌 孙世豪 ZENG Shitong;WANG Dingzhong;LIU Shan;LI Peng;XI Hui;FU Yingjie;LU Binbin;SUN Shihao(Zhengzhou Tobacco Research Institute of CNTC,Zhengzhou 450001,China)
出处 《烟草科技》 CAS CSCD 北大核心 2022年第9期51-56,72,共7页 Tobacco Science & Technology
基金 国家烟草专卖局科技重大专项项目“加热卷烟专用香原料作用特性及加热卷烟调香技术研究”(中烟办[2020]66号) 郑州烟草研究院院长基金项目“烟气口腔刺激化学表征方法研究”(432017CA0170)。
关键词 卷烟 主流烟气 挥发性羰基物 口腔沉积 模拟 Cigarette Mainstream cigarette smoke Volatile carbonyl Oral deposition Simulation
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