摘要
某铝合金连接器在化学镀高磷Ni–P合金后剩磁不合格,通过分析镀层的元素组成和相结构得出是镀层中P含量分布不均所致。通过单因素试验和正交试验优化了化学镀Ni工艺,最终得到剩磁合格的产品。
The remanence of an aluminum alloy connector was unqualified after electroless plating with high-phosphorus Ni-P alloy coating.It was found by analyzing the elemental composition and phase structure of the coating that the non-uniform distribution of P content in the coating was the primary cause.Products with qualified remanence were obtained by optimizing the process parameters of electroless nickel plating by single-factor experiments and orthogonal test.
作者
沈岳军
孙雪松
罗华江
康鑫
安远飞
SHEN Yuejun;SUN Xuesong;LUO Huajiang;KANG Xin;AN Yuanfei(Guizhou Space Appliance Co.,Ltd.,Guiyang 550009,China)
出处
《电镀与涂饰》
CAS
北大核心
2022年第17期1262-1265,共4页
Electroplating & Finishing
基金
军用电子元器件预先研究科研项目(JZX7X20190182002801)。
关键词
铝合金
化学镀
高磷镍-磷合金
剩磁
工艺改进
aluminum alloy
electroless plating
high-phosphorus nickel–phosphorus alloy
remanence
process improvement