集成电路光刻机精密运动台控制方法综述

Ultra-precision motion stage control methods for wafer scanners

集成电路的持续发展推动了信息技术的进步。步进扫描式光刻机是集成电路装备中技术难度最高、价格最昂贵的关键设备。其中,精密运动台是光刻机最为核心的子系统之一,高速、高加速和高精度的要求对控制方法的研究和应用提出了挑战。文中对集成电路光刻机中精密运动台的控制方法进行了综述。首先,介绍了面向光刻机工件台或掩模台单一运动台的前馈反馈复合控制方法;其次,介绍了工件台和掩模台的同步控制方法;最后,介绍了运动台的主动减振控制方法。

The continuous development of the integrated circuit industry has promoted the progress of information technology.The wafer scanner is the most technically difficult and most expensive key machine in integrated circuit equipment.The precision motion stages is one of the core subsystems of the wafer scanner.The requirements of high speed,high acceleration and high precision pose challenges to the research and application of control methods.In this paper,the control methods of the precision motion stage are reviewed.Firstly,the feedforward and feedback composite control method for a single motion stage is introduced,then the synchronous control method of the wafer stage and the reticle stage is analyzed,and finally the active vibration control is summarized.