摘要
介绍了一种超声波清洗液系统的控制原理与方法。该控制系统一般用于晶圆清洗设备,通过软件方法实现对各种功能的控制,保障了晶圆在超声波清洗过程中的清洁效果,同时也提升了设备的安全和稳定性。
The research conclusion of a fluid control system in ultrasonic cleaning is introduced.The control system is generally used in wafer cleaning equipment.It realizes the control of various functions through software method,which not only ensures the processing effect of wafer in the process of ultrasonic cleaning,but also improves the safety and stability of the equipment.
作者
田洪涛
杨旭
田知玲
张金环
陈苏伟
TIAN Hongtao;YANG Xü;TIAN Zhiling;ZHANG Jinhuan;CHEN Suwei(The 45th Research Fluid of CETC,Beijing 100176,China)
出处
《电子工业专用设备》
2022年第4期53-56,共4页
Equipment for Electronic Products Manufacturing
关键词
晶圆清洗设备
超声波清洗
清洗液控制系统
Cleaning equipment
Ultrasonic cleaning
Cleaning fluid control system