Sub-stochiometric MoO_(x) by radio-frequency magnetron sputtering as hole-selective passivating contacts for silicon heterojunction solar cells

The silicon heterojunction(SHJ)solar cell has long been considered as one of the most promising candidates for the next-generation PV market.Transition metal oxides(TMOs)show good carrier selectivity when combined with c-Si solar cells.This has led to the rapid demonstration of the remarkable potential of TMOs(especially MoO_(x))with high work function to replace the p-type a-Si:H emitting layer.MoO_(x) can induce a strong inversion layer on the interface of n-type c-Si,which is beneficial to the extraction and conduction of holes.In this paper,the radio-frequency(RF)magnetron sputtering is used to deposit MoO_(x) films.The optical,electrical and structural properties of MoO_(x) films are measured and analyzed,with focus on the inherent compositions and work function.Then the MoO_(x) films are applied into SHJ solar cells.When the MoO_(x) works as a buffer layer between ITO/p-a-Si:H interface in the reference SHJ solar cell,a conversion efficiency of 19.1%can be obtained.When the MoOx is used as a hole transport layer(HTL),the device indicates a desirable conversion efficiency of 17.5%.To the best of our knowledge,this current efficiency is the highest one for the MoO_(x) film as HTL by RF sputtering.