Ar-N_(2)混合气体中N_(2)含量对磁控溅射Ag膜性能的影响

Effect of N_(2) Content in Ar-N_(2) Gas Mixture on Properties of Ag Films Deposited by Magnetron Sputtering

以不同N_(2)含量Ar-N_(2)混合气体为溅射气体在聚对苯二甲酸乙二醇酯(PET)基膜上磁控溅射制备Ag膜,研究了N_(2)含量对Ag膜动态沉积率、耐盐雾腐蚀性能和反射率的影响。结果表明:随着N_(2)含量增加,制备的Ag膜的晶粒尺寸逐渐减小,在盐雾中的腐蚀速率逐渐降低,动态沉积率和反射率均逐渐降低;综合生产效率和各项性能,优选N_(2)体积分数为20%的Ar-N_(2)混合气体溅射Ag膜工艺,其动态沉积率为纯Ar制备Ag膜的95%,反射率也由纯Ar制备Ag膜的93.8%降低至93.4%,在盐雾中的腐蚀速率降为纯Ar制备Ag膜的22%左右。

Ag films were prepared on polyethylene terephthalate(PET)base film by magnetron sputtering using Ar-N_(2)gas mixture with different N_(2)content as sputtering gas.The effects of N_(2)content on dynamic deposition rate,salt spray corrosion resistance and reflectivity of the Ag film were studied.The results show that with the increase of N_(2) content,the grain size of the prepared Ag film gradually decreased,the corrosion rate in salt spray,dynamic deposition rate and reflectivity decreased gradually.In terms of production efficiency and properties,it was preferable to use the Ar-N_(2)gas mixture sputtering Ag film process with N_(2)volume fraction of 20%.The dynamic deposition rate of the Ag film prepared by the preferable process was 95%of that of Ag film prepared with pure Ar,while the reflectivity was only reduced from 93.8%that of the Ag film prepared with pure Ar to 93.4%,and the corrosion rate in salt spray was reduced to about 22%of that of Ag film prepared with pure Ar.