摘要
In this paper,we report the successful growth of 0.5BiFeO_(3)-0.5PbFe_(0.5)Nb_(0.5)O_(3)/SrTiO_(3)/Si(001)heterostructure using RFcathode sputtering in an oxygen atmosphere.The deposited films have been investigated by X-ray diffractometry and spectroscopic ellip-sometry(SE).0.5BiFeO_(3)-0.5PbFe_(0.5)Nb_(0.5)O_(3)films on silicon substrates with a strontium titanate buffer layer are single-phase,polycrystalline with a texture in the 001 direction.The unit cell parameters calculated in the tetragonal approximation were c=4.005±0.001Å;a=3.995±0.001Å.The presence in the films of small unit cell deformation arising from different unit cells parameters of the film and substrate is observed.Dielectric properties and capacitance-voltage characteristics have been measured.The ellipsometric parameters have been obtained.
基金
The study was carried out with the financial support of the Ministry of Science and Higher Education of the Russian Federation(State task in the field of scientific activity,scientific project No.(0852-2020-0032)/(BAZ0110/20-3-07IF)).
