摘要
随着超短超强自由电子激光等光源的应用,极紫外、X射线波段薄膜反射镜的抗辐照性能备受关注。本文介绍了IPOE实验室搭建的纳秒极紫外辐照损伤装置,并对极紫外-X射线自由电子激光常用的B_(4)C薄膜反射镜、Au和Ru金属单层膜反射镜、B_(4)C/Ru双层膜反射镜以及极紫外光刻用Mo/Si多层膜反射镜开展了辐照损伤测试,获得了不同材料和结构的薄膜反射镜抗损伤性能,结合理论模拟揭示了热熔融、热应力和膜层间扩散反应等损伤机制的作用。
Owing to an increased application of novel light sources such as ultra-short and ultra-intense free electron lasers(FEL),damage resistance of extreme ultraviolet(EUV)and X-ray thin-film mirrors has attracted wide attention. This paper introduces a nanosecond EUV damage instrument manufactured by the Institute of Precision Optical Engineering(IPOE). EUV damage tests were conducted on boron carbide(B_(4)C)reflective mirrors,gold(Au)and ruthenium(Ru)metal monolayer mirrors,B_(4)C/Ru bilayer mirrors commonly used in EUV and X-ray free electron lasers,and molybdenum-silicon(Mo/Si)multilayer mirrors used in EUV lithography. Damage resistances for thin-film mirrors with different optical materials and structures were determined. Combined with theoretical simulations,damage mechanisms such as thermal melting,thermal stress,and interlayer diffusion-reaction were detected.
作者
李文斌
李淑慧
潘刘洋
张哲
谢春
黄秋实
王占山
LI Wenbin;LI Shuhui;PAN Liuyang;ZHANG Zhe;XIE Chun;HUANG Qiushi;WANG Zhanshan(Institute of Precision Optical Engineering,MOE Key Laboratory of Advanced Micro-Structured Materials,Shanghai Frontiers Science Center of Digital Optics,Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China;Sino-German College of Applied Sciences,Tongji University,Shanghai 200092,China)
出处
《光学精密工程》
EI
CAS
CSCD
北大核心
2022年第21期2698-2710,共13页
Optics and Precision Engineering
基金
国家自然科学基金资助项目(No.11875203,No.61621001)。
关键词
极紫外
薄膜反射镜
抗损伤性能
损伤机制
extreme ultraviolet
thin film mirrors
damage resistance
damage mechanism
