一种厚膜片式电阻器抗硫化性能的快速评价方法

A rapid evaluation method for the anti-sulfurization performance of thick film chip resistors

为快速评价厚膜片式电阻器的抗硫化性能,提出了一种新方法。该方法以硫脲为硫源,将样品浸入一定温度的硫脲水溶液中,测试浸入前后的电阻变化率并进行评价。与目前以硫化氢、硫磺等为硫源的方法相比较,该方法在评价速度、环保性、安全性、操作便利性等方面具有明显优势。以银电极样品和抗硫化厚膜片式电阻器为对象,硫脲和硫化氢为硫源,做了两组对照实验,结果表明,硫脲溶液法的评价速度至少是传统硫化氢法的8倍。

A new method was proposed for rapidly evaluating the anti-sulfurization performance of thick film chip resistors.With thiourea as sulfur source,the sample was immersed in an aqueous thiourea solution at certain temperature,and its resistance change rate before and after immersion was measured for evaluation.Compared with current methods using hydrogen sulfide and sulfur as sulfur sources,this method has distinct advantages in evaluation speed,environmental protection,safety,and operational convenience.Two sets of control experiments were conducted with electrode samples and anti-sulfurized thick film chip resistors as objects,and thiourea and hydrogen sulfide as sulfur sources,respectively.Results show that the evaluation speed of using thiourea is at least 8 times quicker than that of hydrogen sulfide.