用于极紫外光刻技术的光刻胶材料研究进展

Progress of Photoresist Materials for Extreme Ultraviolet Lithography

光刻是芯片制造的核心步骤,光刻机与光刻胶在光刻过程中是相互依存、缺一不可的。然而,作为与光刻机同等重要的光刻胶得到的关注较少。一方面是因为鲜有新闻媒体报道光刻胶,民众看到的大部分是与光刻机相关的内容,另一方面是因为国内从事光刻胶相关产业研发的公司较少。目前,国内中低端的印刷电路板用光刻胶已经基本国产化,而用于芯片制造的半导体用光刻胶几乎完全依赖进口。摆脱国外对芯片制造行业的垄断,高端光刻胶国产化也势在必行。目前,最高端的半导体芯片制造使用的是极紫外光源,使用的也是对应的极紫外光刻胶。本文主要聚焦最新极紫外光刻技术中的光刻胶材料研究现状,分别从有机材料以及有机无机杂化材料两个方面进行了归纳总结,希望能为国内新型光刻胶的研发与产业发展提供有意义的参考。

Lithography is the core step of chip manufacturing.The lithography machine and photoresist are interdependent and indispensable in the lithography process.However,photoresist materials have received less attention although they are of the same importance as the lithography machine.On the one hand,there are few news media reports about photoresist materials.And most of what people see is related to the news of lithography machine.On the other hand,there are few domestic famous companies engaged in photoresist related industry research and development.At present,the domestic medium or low-end photoresist for printed circuit board has been basically localized,and the semiconductor photoresist for high-end chip manufacturing almost depends on imports.To overcome the foreign monopoly of chip manufacturing industry,the domestic production of high-end photoresist is imperative,especially the extreme ultraviolet photoresist suitable for high-end chip manufacturing.The most advanced semiconductor chips such as 5 nm and 7 nm were produced by extreme ultraviolet lithography with its corresponding photoresist.This review focuses on the photoresist materials for latest extreme ultraviolet lithography technology,and summarizes the organic photoresist materials and organic-inorganic hybrid photoresist materials.We believed that these references and progress can provide a certain guidance for developing new types of photoresist designed by scientists or engineers,as well as for overcoming the bottleneck of photoresist industry.