半导体洁净厂房FFU与高架地板布置对气流流形影响的分析

Analysis on the Influence of FFU and Raised Floor Layout on Air Flow in Semiconductor Clean Room

当前的洁净室建造中,MAU+FFU+DCC是主流的气流组织方案,而其中高洁净等级的半导体洁净厂房又以高架地板为主要的回风型式,通过FFU与高架地板布置的分析,详细阐述了FFU布置率和高架地板开孔率的匹配关系,并针对某洁净厂房工程实例,结合先进的CFD(Computational Fluid Dynamics计算气体动力学)技术进行模拟分析,探讨不同布置方案下的气流运行情况,为洁净室气流组织设计提供了理论分析和实际经验支持。

In modern society,MAU+FFU+DCC is the mainstream air distribution scheme of the clean room construction,and the high-grade semiconductor clean workshop takes the raised floor as the main return air type.Through the analysis of the layout of FFU and raised floor,this paper expounds the matching relationship between the layout rate of FFU and the opening rate of raised floor in detail.According to one engineering example of a clean workshop,combined with the advanced CFD(Computational Fluid Dynamics)technology,this paper discusses the air flow operation under different layout schemes,which provides theoretical analysis and practical experience support for the air distribution design of clean room.