摘要
提出一种利用调制深度响应曲线的全局信息进行重叠峰识别的结构光照明显微术,采用有边界约束的最优化算法解析得到薄膜样本各表面的高度,进而实现厚度分辨力高、精度高、计算速度快的膜层厚度分布测量与表面形貌重构。根据仿真分析,在理想条件下所提方法可将厚度检测分辨力从483 nm提升至175 nm,并通过实验证明了所提方法可减少迭代次数,且具有较高的重复性精度。
This paper proposes structured illumination microscopy that utilizes the global information in the curve of modulation depth response to identify overlapping peaks and obtains the height of each surface of the thin film sample analytically with an optimization algorithm under boundary constraints.Measurement of layer thickness distribution and surface morphology reconstruction are thereby achieved in a manner of high thickness resolution,high accuracy,and rapid calculation.According to the simulation analysis,the proposed method improves the thickness detection resolution from483 nm to 175 nm under ideal conditions.Furthermore,experiments show that the proposed method reduces the number of iterations and offers high repeatability accuracy.
作者
杨可君
韩陈浩磊
刘磊
冯金花
谢仲业
胡松
唐燕
Yang Kejun;Han Chenhaolei;Liu Lei;Feng Jinhua;Xie Zhongye;Hu Song;Tang Yan(State Key Lab of Optical Technologies on NanoFabrication and MicroEngineering,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,Sichuan,China;University of Chinese Academy of Sciences,Beijing 100049,China;School of Electrical Engineering&Intelligentization,Dongguan University of Technology,Dongguan 523808,Guangdong,China)
出处
《光学学报》
EI
CAS
CSCD
北大核心
2022年第20期74-81,共8页
Acta Optica Sinica
基金
国家自然科学基金(61875201,61975211,62005287)
四川省杰出青年科技人才项目(2020JDJQ0005)
四川省中央引导地方科技发展项目(2020ZYD020)。
关键词
测量
光学检测
结构光照明显微术
光学薄膜
调制深度响应
厚度检测
measurement
optical detection
structured illumination microscopy
optical thin film
modulation depth response
thickness detection
