基于PLC的原子沉积设备控制系统设计与实现

Design and Realization of Atomic Deposition Equipment Control System Based on PLC

目的 为提高原子沉积镀膜工艺的可靠性,稳定薄膜质量,设计基于可编程逻辑控制器(PLC)的一种原子层沉积设备控制系统。方法 针对工作原理和工艺需求,根据传感器和执行器的特点,确定了以西门子S7–200 Smart PLC为控制器,以昆仑通态1070Gi触摸屏作为人机界面的硬件系统方案,实现所有逻辑控制;并利用PLC的晶体管输出端子,采用“PID+PWM”技术进行加热区域温度控制。结果 该控制系统实现了原子沉积镀膜一键操作,保证了镀膜过程中高精度温度均匀性要求(±1℃),确保了设备的可靠性和沉积薄膜的可重复性。结论 经实际应用,证明该控制系统具有稳定性好、误差小、自动化程度高等优点,达到了工艺要求。

The work aims to design an atomic layer deposition equipment control system based on programmable logic controller(PLC) to improve the reliability of atomic deposition coating process and stabilize the film quality. According to the working principle and process requirements, as well as the characteristics of sensors and actuators, a hardware system scheme with Siemens S7-200 Smart PLC as the controller and MCGS 1070Gi touch screen as the man-machine interface was determined. All logic control was realized;and the "PID+PWM" technology was used to control the temperature of the heating area with the transistor output terminal of the PLC. The control system realized one-key operation of atomic deposition coating, which ensured high-precision temperature uniformity requirements(±1℃) during the coating process, and ensured equipment reliability and repeatability of deposited films. After practical application, it is proved that the control system has the advantages of good stability, small error and high degree of automation, and meets the technological requirements.