适用于TEM原位表征的双温区密封腔芯片研制

Design and Fabrication of a Micro-Chip with Dual Sealed Heating Zones for the Application in in-situ TEM

基于透射电子显微镜的原位表征技术是研究低维电子材料的先进技术方法。虽然该技术已有许多发展,但在透射电子显微镜中原位观察化学气相生长过程一直存在困难,其中一项重要挑战就是如何在电镜真空腔体中构建微区高压气氛反应环境。研制了一种适用于透射电子显微镜的双温区密封腔芯片,该芯片的两个加热区可模拟蒸发和生长条件,有助于实现在透射电镜中直接观察低维材料的生长及结构动态演化过程。还通过有限元方法仿真了芯片的温度分布、测试了芯片气密性,并装配到透射电子显微镜样品杆中进行验证。实验结果表明,该芯片可实现在透射电镜中可控加热并观察低维材料的结构演化,能有效拓展原位透射电子显微技术的应用范围。

In-situ TEM is an advanced technology for investigating low-dimension materials.Although many developments have been made recently,to perform in-situ observation of the chemical vapor deposition process direct inside a TEM is yet to be accomplished.One of the challenges is how to construct a micro-reaction region with high reaction pressure inside the TEM column.A micro-chip with two sealed heating cavities for the application in TEM is designed and fabricated.The heating performance and hermeticity of the micro-chip are verified via simulation and leakage test,respectively.Using a commercial TEM holder,the obtained micro-chip is further tested inside the TEM.The results show that the micro-chip is compatible with TEM characterization,facilitating the direct observation of material growth and structure evolution under controllable heating.The corresponding achievements can further expand the application scope of in-situ TEM.