摘要
碳化硅(SiC)金属氧化物半导体场效应晶体管(MOSFET)作为宽禁带半导体单极型功率器件,具有频率高、耐压高、效率高等优势,在高压应用领域需求广泛,具有巨大的研究价值。回顾了高压SiC MOSFET器件的发展历程和前沿技术进展,总结了进一步提高器件品质因数的元胞优化结构,介绍了针对高压器件的几种终端结构及其发展现状,对高压SiC MOSFET器件存在的瓶颈和挑战进行了讨论。
Silicon carbide(SiC)metal oxide semiconductor field effect transistor(MOSFET)as a wide band semiconductor unipolar power devices,with high frequency,high withstand voltage,high efficiency,high demand in high-voltage applications,has great research value.The development history and latest technology progress of high-voltage SiC MOSFET devices are reviewed,cell optimization structures to further improve the device quality factor are summarized,several edge termination structures for high-voltage devices and their development status are introduced,and limits and challenges of high-voltage SiC MOSFET devices are discussed.
作者
孙培元
孙立杰
薛哲
佘晓亮
韩若麟
吴宇薇
王来利
张峰
SUN Peiyuan;SUN Lijie;XUE Zhe;SHE Xiaoliang;HAN Ruolin;WU Yuwei;WANG Laili;ZHANG Feng(School of Electrical Engineering,Xi’an Jiaotong University,Xi’an 710049,China;College of Physical Science and Technology,Xiamen University,Xiamen 361005,China)
出处
《电子与封装》
2023年第1期109-120,共12页
Electronics & Packaging