抛光轮表面形貌对抛光斑质量影响

Influence of Polishing Wheel Surface Topography on the Quality of Polishing Spot

探究小尺寸轮式抛光中轮面形貌对抛光斑的形状和底部粗糙度的影响。从修整速度方向和砂纸粒度大小两个方面研究修整的轮面形貌及抛光斑的质量,修整速度方向分为轮线速度与机床运动方向垂直和平行两种模式,砂纸粒度分为180#、400#和800#。比较不同的轮面粗糙峰分布和线粗糙度及其单点驻留的抛光斑的形状和底部粗糙度。实验结果表明,修整轮线速度和机床运动垂直时的抛光斑质量要优于平行时,180#、400#和800#砂纸修整轮面的线粗糙度分别为Ra7.77μm、Ra4.88μm和Ra2.89μm,所得抛光斑底部0.4 mm范围内粗糙度分别为Sa 0.953 nm、Sa 0.821 nm和Sa 0.551 nm,且抛光斑形状随着砂纸粒度变小更加顺滑。

This paper explores the influence of the wheel-surface topography on the profile and bottom roughness of the polishing spot in small-scale wheel polishing. The topography of the conditioned wheel surface and the quality of the polishing spot are studied from the conditioning velocity direction and the size of the sandpaper particle size. The conditioning velocity direction is divided into two modes: the wheel linear velocity is perpendicular or parallel to the machine tool movement direction. The sandpaper particle size was divided into 180#, 400# and 800#. The distribution of asperities and line roughness of different wheel surfaces and the profile and bottom roughness of the single dwell polishing spot are compared. The experimental results show that the quality of the polishing spot when the wheel conditioning linear velocity is perpendicular to the machine tool movement direction is better than that when they are parallel. The line roughness of 180#, 400# and 800# sandpaper conditioning wheel surface are Ra7.77 μm, Ra4.88 μm and Ra2.89 μm,respectively, and the roughness within 0.4 mm of the bottom of the obtained polishing spot are Sa0.953 nm, Sa0.821 nm,and Sa0.551 nm, respectively, and the shape becomes smoother as the particle size of the sandpaper decreases.