8英寸半导体厂房给排水系统设计工程实例分析

介绍半导体厂厂房给排水系统的设计要点,该系统具有涉及面广、系统相对分散且复杂的特点。并以某8英寸半导体集成电路制造生产线建设项目为例,介绍给排水系统的构成,对部分设计工艺和参数做介绍。其中超纯水采用双RO的创新性工艺设计,不但能满足车间生产需求,还大大降低工程造价成本。因此,该文认为给排水设计是工业厂房设计中非常重要的部分,采用新型工艺设计能够大大减少建设成本。

This paper introduces the design points of the water supply and drainage system of the semiconductor plant.The system has the characteristics of wide coverage,relatively decentralized system and complexity.Taking the construction project of an 8-inch semiconductor integrated circuit manufacturing line as an example,the composition of the water supply and drainage system is introduced,and some design processes and parameters are introduced.The ultra pure water adopts the innovative process design of double RO,which can not only meet the production needs of the workshop,but also greatly reduce the project cost.Therefore,this paper believes that water supply and drainage design is a very important part of industrial plant design,and the use of new process design can greatly reduce the construction cost.