有机玻璃基底AZO/Ag/AZO复合薄膜的制备与性能

Preparation and properties of AZO/Ag/AZO thin films on PMMA substrates

采用低温磁控溅射技术在有机玻璃(聚甲基丙烯酸甲酯PMMA)表面制备铝掺杂氧化锌(AZO)叠层AZO/Ag/AZO透明导电薄膜,研究AZO溅射功率对AZO/Ag/AZO薄膜结构和性能的影响,探讨PMMA层合结构的耐湿热性和加温性能。通过扫描电子显微镜(SEM)、原子力显微镜(AFM)、X射线衍射仪(XRD)表征薄膜的形貌和结构。结果表明:AZO的溅射功率影响了AZO层表面能以及薄膜的结晶度,在100 W和150 W溅射功率下制备出的AZO/Ag/AZO薄膜室温下具有3.7Ω/sq的低薄膜电阻和86.1%的高透光率,采用PMMA和聚氨酯胶片对薄膜进行层合封装,湿热30天后仍保持光学、电学性能稳定。PMMA层合结构在加温过程中的时间-温度曲线表明在5 V直流电压下层合玻璃具有较快的温度响应时间和良好的温度均匀性。-10~-40℃空气对流中PMMA层合结构表现出良好的温度稳定性。

AZO/Ag/AZO transparent conductive films were prepared on PMMA substrate by DC magnetron sputtering at low temperature(70 ℃).The effect of AZO sputtering power on the structure and properties of AZO/Ag/AZO thin films were investigated.In order to encapsulate AZO/Ag/AZO films,the films were laminated with another uncoated PMMA substrate and polyurethane film.Damp and heat resistance and heating performance of this laminated structure were discussed.The morphology and structure of the films were characterized by SEM,XRD and AFM.The results show that the sputtering power of AZO affects the surface energy of AZO layer and the crystallization of AZO/Ag/AZO films.The AZO/Ag/AZO films which prepared with AZO sputtering power of 100W and 150W exhibit the best performance with a low sheet resistance of 3.7 Ω/sq and a high transmittance of86.1% at room temperature.The optical and electrical properties of PMMA laminated structure remain stable after 30 days of dampheat experiment.The temperature-time curve during the heating process of the PMMA laminated structure at room temperature shows fast temperature response time and good temperature uniformity under 5 V DC voltage.The PMMA laminated structure exhibits saturation temperature stability in cold convection air(-10--40 ℃).