第二代半导体材料及其原材料高纯砷

The Second Generation Semiconductor Material and Its Raw Material High Purity Arsenic

本文综合阐述了第二代半导体材料砷化镓原材料高纯砷的特性,砷储量及分布情况、应用,对比了现有制备技术的优缺点,对影响高纯砷纯度的相关因素进行了分析讨论。目前制备高纯砷的主要技术有升华蒸馏法、铅熔池升华法、砷化氢热分解法、氯化还原法、硫化还原和氧化砷+盐酸还原法等。其中氯化还原法和氧化砷+盐酸还原法是目前工业产量化应用最多的方法。氯化还原法由于其工序冗长,过程中存在氯气等剧毒气体,对设备防腐要求较高,存在安全环保风险;氧化砷+盐酸还原法因其副产物可回收重复利用,工艺流程相对较短,废液、废气和废渣产生更少,对环境更友好。同时讨论了高纯砷粉的制备和杂质的影响及除杂方法。更高纯度、更大规模、更节能、更安全环保、自动化是未来高纯砷的发展方向。

In this paper, the characteristics, storage, distribution and application of high purity ARSENIC of the second generation semiconductor material gallium arsenide are comprehensively described. The advantages and disadvantages of the existing preparation techniques are compared, and the related factors affecting the purity of high purity arsenic are analyzed and discussed. At present, the main techniques for preparing high purity arsenic include sublimation distillation, lead pool sublimation, thermal decomposition of hydrogen arsenide, chlorination reduction, sulfide reduction and arsenic oxide + hydrochloric acid reduction. Among them, chlorination reduction and arsenic oxide + hydrochloric acid reduction are the most widely used methods in industrial production. Due to the lengthy process and the presence of highly toxic gases such as chlorine in the process, the chlorination reduction method requires high anti-corrosion requirements for equipment and has safety and environmental protection risks. Arsenic oxide + hydrochloric acid reduction method is more environmentally friendly because its by-products can be recycled and reused, the process is relatively short, and the waste liquid, waste gas and waste residue are less generated. At the same time, the preparation of high purity arsenic powder, the influence of impurities and the impurity removal method are discussed. Higher purity, larger scale, more energy saving,more safety and environmental protection, automation are the development direction of high purity arsenic in the future.