CTAB和硫脲对Ni-P镀层耐蚀性能的影响研究

Effect of CTAB and Thiourea on Corrosion Resistance of Ni-P Coating

研究了CTAB和硫脲对Ni(P)层耐腐蚀性能的影响。结果表明,用硫脲制备的Ni(P)试样在1 nm深度处的平均O含量为27.74%,大于腐蚀测试Ni(P)层深度1 nm处的平均O含量(14.43at%),说明在Ni(P)镀液中添加硫脲可使Ni(P)镀层的耐蚀性大大降低。在Ni(P)镀液中加入CTAB后,Ni(P)层平均P含量增加,高P含量进一步提高了Ni(P)层的耐蚀性。此外,在镀液中添加CTAB对Ni(P)层耐蚀性的积极作用会抑制镀液中添加硫脲的消极作用。

The effect of CTAB and thiourea on the corrosion resistance of Ni(P) layer was studied. The results showed that the average O content of Ni(P) samples prepared with thiourea was 27.74% at the depth of 1 nm, which was higher than the average O content(14.43at%) at the depth of Ni(P) layer at 1 nm, indicating that the corrosion resistance of Ni(P) coating can be greatly reduced by adding thiourea in Ni(P) bath. After adding CTAB into Ni(P) bath, the average P content of Ni(P) layer increases, and the high P content further improves the corrosion resistance of Ni(P) layer. In addition, the positive effect of adding CTAB on the corrosion resistance of Ni(P) layer will inhibit the negative effect of adding thiourea in the bath.