美国华裔科技人才面临的多维困境分析——国际学术流动的视角

American Chinese Talents Dilemma:A Perspective of International Academic Mobility

论文从认同、人力资本、国际学术流动三个决定美国华裔科技人才环流或回流的核心要素出发,分析了华裔科技人才在美国这个外部因素的影响下面临的多维困境:一是被质疑政治忠诚和与祖籍国保持多缘联系的认同困境;二是人力资本在美国面临贬值和与中国开展科研合作或回流进行增值的困境;三是作为国际学术交流的积极推动者和被指控为“科技间谍”的困境;并得出结论:认同、人力资本和国际学术流动是影响美国华裔科技人才环流或回流的内在因素,美国的对华政策及其对华裔科技人才的举措是影响其环流或回流的外在因素。

The researcher gives an analysis of the multilayered dilemma that Chinese scientific and technical talents in America currently face.First of all,they are under a rigid identity test due to their linkages to China as homeland and at the same time political allegiance to the US as their adopted country.Next,the value of their human capital may be affected by being compelled to reduce collaboration between research centers of the world and researchers in China under the political circumstances at present.Lastly,they may be accused of“scientific spies”if they are active in promoting international academic exchange between China and America.The paper argues that three inner forces——identity,value of human capital and international academic mobility together drive an international circulation of scientific and technical talents among Chinese Americans.And the US is an external factor in affecting the actual move of one individual.