摘要
从体系和沉积方法入手,分析了强氮化金属元素体系、弱氮化金属元素体系及含非金属元素体系在结构上的特性和共性给高熵氮化物涂层性能带来的影响,阐述磁控溅射和电弧离子镀膜技术沉积涂层的表面形貌、微观结构及性能方面的差异性,并分别总结这些制备技术的优缺点。最后对高熵氮化物涂层体系在结构成分设计和沉积方法两方面未来的研究方向进行了展望。
The characteristic properties and similarities of the high-entropy nitride coatings prepared with the strongly and weakly nitridable metals and with nonmetallic elements were analyzed in terms of elemental composition and deposition method. The differences in surface morphology, microstructure, and properties of high-entropy nitride coatings deposited by magnetron sputtering and arc ion plating techniques were described, and the advantages and disadvantages of these preparation techniques were summarized respectively. The future research directions of high-entropy nitride coating systems in terms of structural composition design and deposition method were proposed.
作者
程驰
郭朝乾
李海庆
李剑微
曲帅杰
张程
林松盛
CHENG Chi;GUO Chaoqian;LI Haiqing;LI Jianwei;QU Shuaijie;ZHANG Cheng;LIN Songsheng(School of Electromechanical Engineering,Guangdong University of Technology,Guangzhou 510006,China;Institute of New Materials,Guangdong Academy of Sciences,National Engineering Laboratory of Modern Materials Surface Engineering Technology,Guangdong Provincial Key Laboratory of Modern Surface Engineering Technology,Guangzhou 510651,China)
出处
《电镀与涂饰》
CAS
北大核心
2023年第3期40-49,共10页
Electroplating & Finishing
基金
国家自然科学基金(52101081)
广东省科技计划(2021A1515010692)
广州市青年科技人才托举项目(QT20220101145)。
关键词
高熵氮化物涂层
物理气相沉积
磁控溅射
电弧离子镀
力学性能
综述
high-entropy nitride coating
physical vapor deposition
magnetron sputtering
arc ion plating
mechanical property
review
