摘要
本文利用第一性原理计算讨论了硫族元素掺杂单层Ag_(2)S的缺陷形成能和电子性质.缺陷形成能反映了在富Ag条件下的掺杂更容易.计算得到的带隙、Mulliken布居和态密度展示出了其相应结构的电子性质.与纯单层的Ag_(2)S相比,Se/Te掺杂Ag_(2)S后的带隙显示出其电导率变化不大.基于Mulliken原子和键布居,研究了硫族元素掺杂后Ag_(2)S中的共价性.此外,通过讨论态密度,分析了能级的移动和电子的贡献.
We use the first-principles calculations to discuss the defect formation energy and electronic properties of chalcogen-doped single-layer Ag_(2)S.The defect formation energies reflect that the energetic favorability of doping under Ag-rich condition is recommended.The electronic properties are embodied by the corresponding characters of the band gap,Mulliken populations and density of states.Compared to pure single-layer Ag_(2)S,the band gaps of Ag_(2)S with Se/Te doping reflect that the electrical conductivity is about the same.The Mulliken atomic and bond populations are discussed to investigate the covalency of Ag_(2)S after chalcogen doping.In addition,the shifts of energy levels and the electrons contributions are analyzed by discussing the density of states.
作者
曾薇
洪丹
刘正堂
ZENG Wei;HONG Dan;LIU Zheng-Tang(School of Pharmacy,Chengdu University of Traditional Chinese Medicine,Chengdu 611137,China;Bond and Band Engineering Group,Southwest Jiaotong University,Chengdu 610031,China;State Key Laboratory of Solidification Processing,Northwestern Polytechnical University,Xi’an 710072,China)
出处
《原子与分子物理学报》
CAS
北大核心
2023年第4期135-141,共7页
Journal of Atomic and Molecular Physics
关键词
第一性原理计算
形成能
电子性质
First-principles calculations
Formation energy
Electronic properties