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一种稀碱水显影的紫外负性光刻胶

A Kind of Negative UV Photoresist Developable in Dilute Aqueous Base
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摘要 以改性聚乙烯醇为成膜树脂,制备了一种稀碱水显影的紫外负性光刻胶。将不饱和脂肪酸酐与聚乙烯醇进行酯化反应得到部分酯化的产物,将其与双叠氮化合物BAC-M一起溶于有机溶剂中,制成负性光刻胶。其成像原理与环化橡胶-双叠氮负胶类似,主要是通过曝光区叠氮基团的光解产物-氮卡宾与聚乙烯醇酯化物发生交联反应,曝光后不需后烘过程就可以实现显影成像。与环化橡胶体系用二甲苯类有机溶剂显影相比,该体系实现了稀碱水显影,曝光成像实验表明,该体系在分辨率、光敏性和耐湿法蚀刻方面表现出良好的性能。 In this paper, a UV negative photoresist developed with dilute alkaline water was prepared by using the modified polyvinyl alcohol as the film-forming resin. The unsaturated fatty acid anhydride and polyvinyl alcohol are subjected to esterification reaction to obtain a partially esterified product, which is dissolved in an organic solvent together with the bisazide compound BAC-M to prepare a negative photoresist. Its imaging principle is similar to that of cyclized rubber-bisazide negative adhesive, mainly through the cross-linking reaction of nitrogen carbene and polyvinyl alcohol ester, the photolysis product of azide group in the exposure area, without post-baking process after exposure. Development imaging can be achieved. Compared with the development of the cyclized rubber system with xylene-based organic solvents,the system achieved dilute alkaline water development, and exposure imaging experiments showed that the system showed good performance in terms of resolution, photosensitivity and wet etching resistant.
作者 王昊阳 史海媚 路世伟 尤凤娟 王力元 WANG Hao-yang;SHI Hai-mei;LU SHI-wei;YOU Feng-juan;WANG Li-yuan(College of Chemistry,Beijing Normal University,Beijing 100875,China;Hebei Liye Chemical Products Co.,Ltd.,Handan,Hebei 057550,China)
出处 《浙江化工》 CAS 2023年第2期17-22,共6页 Zhejiang Chemical Industry
关键词 水显影 负性光刻胶 聚乙烯醇 water-developable negative photoresist PVA
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