大数值孔径(NA=0.55)变倍率极紫外光刻投影物镜偏振像差高精度检测方法

High-Precision Measurement Method of Polarization Aberrations for Large Numerical Aperture(NA=0.55)Variable-Magnification Extreme Ultraviolet Lithography Projection Objective

提出了一种严格的非线性成像测量大数值孔径(NA=0.55)变倍率极紫外光刻(EUVL)投影物镜偏振像差的方法。首先在变倍率极紫外(EUV)严格矢量成像模型基础上,通过建立偏振像差与空间像频谱的非线性关系,得到非线性超定方程组,并提出一种同步旋转测量的方法,通过构建和训练深度神经网络算法求解严格非线性超定方程组,实现了EUV投影物镜偏振像差琼斯光瞳的高精度快速测量。仿真结果表明,测量精度达到了10^(-4)λ(λ为波长)量级,该技术将支撑3~7 nm技术节点EUVL质量的在线监控。

This paper proposes a rigorous nonlinear measurement method of polarization aberrations for the large numerical aperture(NA=0.55)variable-magnification extreme ultraviolet lithography(EUVL)projection objective.First,on the basis of the rigorous variable-magnification extreme ultraviolet(EUV)vector imaging model,the nonlinear overdetermined equations are established with the nonlinear relationships between polarization aberrations and spatial image spectra.Then,a synchronous rotation measurement method is proposed,which constructs and trains a deep neural network algorithm to solve the rigorous nonlinear overdetermined equations and thus achieves the Jones pupil measurement of polarization aberrations for the EUV projection objective with high precision and efficiency.The simulation results show that this method can realize the measurement precision of 10^(-4)λ(λdenotes the wavelength),which will support the online quality monitoring of EUVL at 3-7 nm technical nodes.