基于Fluent的批量型原子层沉积反应器流场分析及实验研究

Flow Field Analysis and Experimental Study of Batch Atomic Layer Deposition Reactor Based on Fluent Model

目前批量原子层沉积反应器存在气体扩散不均、腔室利用率低、反应副产物残余等缺点,影响了沉积薄膜的质量,降低了生产效率。针对以上问题,利用Fluent软件建立起批量原子层沉积反应器的仿真模型,首先分析了反应器添加不同结构尺寸的匀气挡板对气体速度、浓度以及扩散时间的影响;其次分析了片架间的距离对气体速度的影响;并将Al2O3薄膜的均匀性实验结果与仿真模拟结果进行对比,验证了仿真模型的准确性与可靠性,为批量原子层沉积反应器的改进与优化设计提供了参考。

At present,batch atomic layer deposition reactors have some disadvantages,such as uneven gas diffusion,low chamber utilization,the residual reaction of by-products,etc.,which affect the quality of deposited films and reduce production efficiency.In view of the above problems,the simulation model of batch atomic layer deposition reactor is established by using Fluent software.Firstly,the effects of adding uniform gas baffles with different structural sizes to the reactor on gas velocity,concentration and diffusion time are analyzed;secondly,the influence of the distance between the racks on the gas velocity is analyzed.The results of Al2O3 film uniformity in the experiment and simulation are compared to verify the accuracy and reliability of the simulation model.It provides a reference for the improvement and optimization design of batch atomic layer deposition reactor.