金属氧化物TFT工艺中铜/钛蚀刻液浓度控制体系研究

Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field-effect Transistor

深入分析了铜钛刻蚀液的刻蚀机理,并对刻蚀液浓度的变化进行实验分析。在此基础上,通过实验完成了铜钛刻蚀液浓度变化模型曲线的研发,并提出了进行浓度控制的方法,实现了铜钛刻蚀液的稳定应用并极大地提高刻蚀液的使用寿命。研究为相关领域的生产和研发提供了一定的参考。

The etching mechanism of Cu/Ti etchant and the change of etchant concentration was experimentally analyzed. On the basis, the changing curve of etchant concentration was clearly checked by experimental results. The control method of Cu/Ti etchant concentration was also suggested. And then, the life time and stability of Cu/Ti etchant was obvious improved,providing some reference for the research and production of related field.